nanoscience nanotechnologies and nanophysics springer 2006 - 33
1 Lithography and Etching Processes
Liquid resist solution Substrate held by suction
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Turntable
ω : angular speed
Fig. 1.2. Spreading the resist layer using a turntable
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a few nanometers, by adjusting the solubility of the polymer in the solvent, the intrinsic viscosity of the polymer macromolecules, and the angular speed of the substrate on the turntable. Before exposure, the substrate is raised to a moderate temperature (around 100◦ C) to evaporate any excess solvent molecules incorporated within the resist layer (soft bake). This makes the thickness of the coating more uniform. The resist is exposed using the lithography tool. The resist layer is modified locally. In general, these modifications are of a chemical nature and no topographical features are visible on the layer. A latent image is formed at the end of the lithography process. The result is then developed by immersing the substrate in the appropriate solvent, which dissolves the resist selectively according to the degree of exposure. In the case of a positive resist, development leads to the formation of a hole in the exposed regions (weak solvent for the initial polymer), whereas in the case of a negative resist, development dissolves the resist rather in the unexposed regions (strong solvent for the initial polymer). Finally, there is a post-exposure bake, in which the substrate is raised to a higher temperature (around 120◦ C) in order to evaporate excess solvent molecules from the development phase, and in some cases to harden the polymer in an irreversible manner by favouring cross-link reactions between the macromolecular chains. Any resist remaining on the surface is then more robust for the ensuing microfabrication operations.
1.2.2 Sensitivity and Contrast The most important parameters characterising a resist layer are sensitivity and contrast. The sensitivity of the resist refers to the intensity of the relevant radiation or interaction used in the lithography, often called the dose, required to
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